en Research Paper Research Paper <span style="font-size:12.0pt"><span style="line-height:200%"><span arial="" style="font-family:">Powder-based Physical Vapor Deposition (PPVD) was utilized to deposit doped TiO₂ thin layers, to modify electronic and optical properties. The modification was performed using different dopants (MnO₂, Ta₂O₅, Nb₂O₅) at different concentrations (0.05 and 0.1 mol%) respectively. The structural characterization by FESEM reveals that the size of the grain varied with respect to the dopants. The sample doped at lower concentration demonstrates a larger crystallite size than the sample doped at higher concentration. This trend is consistent with the measured grain size of the doped thin layer samples. The nonlinearity coefficient (&alpha;) and breakdown voltage at lower ranges are enhanced as the dopant concentration in the TiO₂lattice increases due to the reduction of grain size. While, the optical properties of doped TiO₂ thin layers with respect to energy bandgap demonstrated enhancement trend with the addition of the dopant as revealed by UV-Vis&rsquo;s reflectance analysis. The enhancement of electrical and optical properties is contributed by the formation of barrier layer surrounding the grains, which in return increases the conductivity of the doped TiO₂ thin layers sample. Conclusively, this study demonstrates the feasibility of the PPVD method in producing a dense thin layer structure for further optical and electrical based applications.</span></span></span> titanium dioxide,powder physical vapor deposition,energy bandgap 118 128 http://ijmse.iust.ac.ir/browse.php?a_code=A-10-5469-1&slc_lang=en&sid=1 Muhammad Rizwan materialist.riz@gmail.com 1800319475328460019674 1800319475328460019674 Yes NED University of Engineering and Technology